ULVAC Inc and Oxford Instruments Plasma Technology Collaborate to Bring Atomic Scale Processing Solutions to the Japanese Power and RF MarketsJanuary 16, 2019 by Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology announces a key collaboration which will bring leading-edge deposition and etch technology solutions to GaN- and SiC-based Wide Band Gap production customers in Japan
Leading semiconductor equipment solution providers, Oxford Instruments Plasma Technology (a trading name of Oxford Instruments Nanotechnology Tools Limited, Tubney, Oxford, UK) and ULVAC Inc., (Chigasaki, Kanagawa, Japan) are delighted to announce a key collaboration which will bring leading-edge deposition and etch technology solutions to GaN- and SiC-based Wide Band Gap production customers in Japan.
“Oxford Instruments Plasma Technology is excited to be collaborating with ULVAC in order to bring its proven process solutions to the Japanese power and RF markets”, commented Mike Gansser-Potts, Managing Director, Oxford Instruments Plasma Technology. “This relationship, which will begin with ULVAC as our channel partner in Japan, will allow local production customers access to Oxford Instruments’ suite of Atomic Scale Processing solutions”
“This is indeed a very significant collaboration”, confirmed Tetsuya Shimada, General Manager for Advanced Electronics Equipment Division of ULVAC Inc. “Our new collaborator, Oxford Instruments Plasma Technology, has critical process technology and know-how which complements our own capabilities. Combined with our customer support infrastructure this will allow us to provide a complete solution to our Japanese customers.”
Oxford Instruments Plasma Technology’s Atomic Layer Deposition (ALD) and Atomic Layer Etch (ALE) are critical process steps for GaN- and SiC-based devices to enable functionality and reliable device manufacturing. With the critical know-how and expertise gained over the last ten years in Wide Band Gap applications, Oxford Instruments Plasma Technology is perfectly placed to serve the technology leading Japanese production customers in these markets.
Oxford Instruments Plasma Technology is a leading provider of etch and deposition processing solutions for nanometre sized features, nanolayers and the controlled growth of nanostructures.. They have been trading since 1982 and has developed a process solution library of over 7,000 recipes. We have over 500 years of experience in plasma physics across the group to give our customers access to a fantastic knowledge base. These solutions are based on core technologies in plasma, ion beam and atomic layer deposition and etch. Products range from clustered cassette-to-cassette platforms for high-throughput production processing to compact stand-alone systems for R&D.